TiO2 films prepared using plasma ion assisted deposition for photocatalytic application

C. Zhao; D. Child; D. Gibson; E. Placido; Y Q Fu

doi:10.1016/j.materresbull.2014.09.022

TiO2 films prepared using plasma ion assisted deposition for photocatalytic application

C. Zhao, D. Child, D. Gibson, E. Placido, Y Q Fu

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Anatase TiO2 films were synthesized on glass substrates using a plasma ion assisted deposition (PIAD) without external heating or subsequent annealing. The low temperature PIAD process produced crystalline anatase films with increased hardness and Young's modulus, reduced film surface roughness and improved optical properties compared with those deposited without ion assistance, as well as a possibility to be applied to a wider range of substrates. Photocatalytic characterization showed that significant increases in photocatalytic stability and efficiency were achieved after using the PIAD process, although surface roughness and porosity of the films decreased slightly.

Original language	English
Pages (from-to)	890-894
Journal	Materials Research Bulletin
Volume	60
DOIs	https://doi.org/10.1016/j.materresbull.2014.09.022
Publication status	Published - Dec 2014

Keywords

Thin films
Plasma deposition
X-ray diffraction
Electron microscopy
Crystal structure
Catalytic properties

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10.1016/j.materresbull.2014.09.022

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title = "TiO2 films prepared using plasma ion assisted deposition for photocatalytic application",

abstract = "Anatase TiO2 films were synthesized on glass substrates using a plasma ion assisted deposition (PIAD) without external heating or subsequent annealing. The low temperature PIAD process produced crystalline anatase films with increased hardness and Young's modulus, reduced film surface roughness and improved optical properties compared with those deposited without ion assistance, as well as a possibility to be applied to a wider range of substrates. Photocatalytic characterization showed that significant increases in photocatalytic stability and efficiency were achieved after using the PIAD process, although surface roughness and porosity of the films decreased slightly. ",

keywords = "Thin films, Plasma deposition, X-ray diffraction, Electron microscopy, Crystal structure, Catalytic properties",

author = "C. Zhao and D. Child and D. Gibson and E. Placido and Fu, {Y Q}",

year = "2014",

month = dec,

doi = "10.1016/j.materresbull.2014.09.022",

language = "English",

volume = "60",

pages = "890--894",

journal = "Materials Research Bulletin",

issn = "0025-5408",

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TY - JOUR

T1 - TiO2 films prepared using plasma ion assisted deposition for photocatalytic application

AU - Zhao, C.

AU - Child, D.

AU - Gibson, D.

AU - Placido, E.

AU - Fu, Y Q

PY - 2014/12

Y1 - 2014/12

N2 - Anatase TiO2 films were synthesized on glass substrates using a plasma ion assisted deposition (PIAD) without external heating or subsequent annealing. The low temperature PIAD process produced crystalline anatase films with increased hardness and Young's modulus, reduced film surface roughness and improved optical properties compared with those deposited without ion assistance, as well as a possibility to be applied to a wider range of substrates. Photocatalytic characterization showed that significant increases in photocatalytic stability and efficiency were achieved after using the PIAD process, although surface roughness and porosity of the films decreased slightly.

AB - Anatase TiO2 films were synthesized on glass substrates using a plasma ion assisted deposition (PIAD) without external heating or subsequent annealing. The low temperature PIAD process produced crystalline anatase films with increased hardness and Young's modulus, reduced film surface roughness and improved optical properties compared with those deposited without ion assistance, as well as a possibility to be applied to a wider range of substrates. Photocatalytic characterization showed that significant increases in photocatalytic stability and efficiency were achieved after using the PIAD process, although surface roughness and porosity of the films decreased slightly.

KW - Thin films

KW - Plasma deposition

KW - X-ray diffraction

KW - Electron microscopy

KW - Crystal structure

KW - Catalytic properties

U2 - 10.1016/j.materresbull.2014.09.022

DO - 10.1016/j.materresbull.2014.09.022

M3 - Article

SN - 0025-5408

VL - 60

SP - 890

EP - 894

JO - Materials Research Bulletin

JF - Materials Research Bulletin

ER -

TiO2 films prepared using plasma ion assisted deposition for photocatalytic application

Abstract

Keywords

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