TiO2 films prepared using plasma ion assisted deposition for photocatalytic application

C. Zhao, D. Child, D. Gibson, E. Placido, Y Q Fu

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Anatase TiO2 films were synthesized on glass substrates using a plasma ion assisted deposition (PIAD) without external heating or subsequent annealing. The low temperature PIAD process produced crystalline anatase films with increased hardness and Young's modulus, reduced film surface roughness and improved optical properties compared with those deposited without ion assistance, as well as a possibility to be applied to a wider range of substrates. Photocatalytic characterization showed that significant increases in photocatalytic stability and efficiency were achieved after using the PIAD process, although surface roughness and porosity of the films decreased slightly.
Original languageEnglish
Pages (from-to)890-894
JournalMaterials Research Bulletin
Volume60
DOIs
Publication statusPublished - Dec 2014

Keywords

  • Thin films
  • Plasma deposition
  • X-ray diffraction
  • Electron microscopy
  • Crystal structure
  • Catalytic properties

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