Surface microstructures and corrosion resistance of Ni-Ti-Nb shape memory thin films

Kun Li; Yan Li; Xu Huang; Desmond Gibson; Yang Zheng; Jiao Liu; Lu Sun; Yong Qing Fu

doi:10.1016/j.apsusc.2017.04.070

Surface microstructures and corrosion resistance of Ni-Ti-Nb shape memory thin films

Kun Li, Yan Li, Xu Huang, Desmond Gibson, Yang Zheng, Jiao Liu, Lu Sun, Yong Qing Fu

Research output: Contribution to specialist publication › Article

32 Citations (Scopus)

Abstract

Ni-Ti-Nb and Ni-Ti shape memory thin films were sputter-deposited onto silicon substrates and annealed at 600 °C for crystallization. X-ray diffraction (XRD) measurements indicated that all of the annealed Ni-Ti-Nb films were composed of crystalline Ni-Ti (Nb) and Nb-rich grains. X-ray photoelectron spectroscopy (XPS) tests showed that the surfaces of Ni-Ti-Nb films were covered with Ti oxides, NiO and Nb₂O₅. The corrosion resistance of the Ni-Ti-Nb films in 3.5 wt.% NaCl solution was investigated using electrochemical tests such as open-circuit potential (OCP) and potentio-dynamic polarization tests. Ni-Ti-Nb films showed higher OCPs, higher corrosion potentials (Ecorr) and lower corrosion current densities (icorr) than the binary Ni-Ti film, which indicated a better corrosion resistance. The reason may be that Nb additions modified the passive layer on the film surface. The OCPs of Ni-Ti-Nb films increased with further Nb additions, whereas no apparent difference of Ecorr and icorr was found among the Ni-Ti-Nb films.

Original language	English
Pages	63 - 67
Volume	414
Specialist publication	Applied Surface Science
Publisher	Elsevier B.V.
DOIs	https://doi.org/10.1016/j.apsusc.2017.04.070
Publication status	Published - 31 Aug 2017

Keywords

Ni-Ti-Nb; Thin film; Microstructures; Corrosion resistance

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http://nrl.northumbria.ac.uk/30434/Licence: CC BY

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title = "Surface microstructures and corrosion resistance of Ni-Ti-Nb shape memory thin films",

abstract = "Ni-Ti-Nb and Ni-Ti shape memory thin films were sputter-deposited onto silicon substrates and annealed at 600 °C for crystallization. X-ray diffraction (XRD) measurements indicated that all of the annealed Ni-Ti-Nb films were composed of crystalline Ni-Ti (Nb) and Nb-rich grains. X-ray photoelectron spectroscopy (XPS) tests showed that the surfaces of Ni-Ti-Nb films were covered with Ti oxides, NiO and Nb2O5. The corrosion resistance of the Ni-Ti-Nb films in 3.5 wt.% NaCl solution was investigated using electrochemical tests such as open-circuit potential (OCP) and potentio-dynamic polarization tests. Ni-Ti-Nb films showed higher OCPs, higher corrosion potentials (Ecorr) and lower corrosion current densities (icorr) than the binary Ni-Ti film, which indicated a better corrosion resistance. The reason may be that Nb additions modified the passive layer on the film surface. The OCPs of Ni-Ti-Nb films increased with further Nb additions, whereas no apparent difference of Ecorr and icorr was found among the Ni-Ti-Nb films.",

keywords = "Ni-Ti-Nb; Thin film; Microstructures; Corrosion resistance",

author = "Kun Li and Yan Li and Xu Huang and Desmond Gibson and Yang Zheng and Jiao Liu and Lu Sun and Fu, {Yong Qing}",

year = "2017",

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doi = "10.1016/j.apsusc.2017.04.070",

language = "English",

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T1 - Surface microstructures and corrosion resistance of Ni-Ti-Nb shape memory thin films

AU - Li, Kun

AU - Li, Yan

AU - Huang, Xu

AU - Gibson, Desmond

AU - Zheng, Yang

AU - Liu, Jiao

AU - Sun, Lu

AU - Fu, Yong Qing

PY - 2017/8/31

Y1 - 2017/8/31

N2 - Ni-Ti-Nb and Ni-Ti shape memory thin films were sputter-deposited onto silicon substrates and annealed at 600 °C for crystallization. X-ray diffraction (XRD) measurements indicated that all of the annealed Ni-Ti-Nb films were composed of crystalline Ni-Ti (Nb) and Nb-rich grains. X-ray photoelectron spectroscopy (XPS) tests showed that the surfaces of Ni-Ti-Nb films were covered with Ti oxides, NiO and Nb2O5. The corrosion resistance of the Ni-Ti-Nb films in 3.5 wt.% NaCl solution was investigated using electrochemical tests such as open-circuit potential (OCP) and potentio-dynamic polarization tests. Ni-Ti-Nb films showed higher OCPs, higher corrosion potentials (Ecorr) and lower corrosion current densities (icorr) than the binary Ni-Ti film, which indicated a better corrosion resistance. The reason may be that Nb additions modified the passive layer on the film surface. The OCPs of Ni-Ti-Nb films increased with further Nb additions, whereas no apparent difference of Ecorr and icorr was found among the Ni-Ti-Nb films.

AB - Ni-Ti-Nb and Ni-Ti shape memory thin films were sputter-deposited onto silicon substrates and annealed at 600 °C for crystallization. X-ray diffraction (XRD) measurements indicated that all of the annealed Ni-Ti-Nb films were composed of crystalline Ni-Ti (Nb) and Nb-rich grains. X-ray photoelectron spectroscopy (XPS) tests showed that the surfaces of Ni-Ti-Nb films were covered with Ti oxides, NiO and Nb2O5. The corrosion resistance of the Ni-Ti-Nb films in 3.5 wt.% NaCl solution was investigated using electrochemical tests such as open-circuit potential (OCP) and potentio-dynamic polarization tests. Ni-Ti-Nb films showed higher OCPs, higher corrosion potentials (Ecorr) and lower corrosion current densities (icorr) than the binary Ni-Ti film, which indicated a better corrosion resistance. The reason may be that Nb additions modified the passive layer on the film surface. The OCPs of Ni-Ti-Nb films increased with further Nb additions, whereas no apparent difference of Ecorr and icorr was found among the Ni-Ti-Nb films.

KW - Ni-Ti-Nb; Thin film; Microstructures; Corrosion resistance

U2 - 10.1016/j.apsusc.2017.04.070

DO - 10.1016/j.apsusc.2017.04.070

M3 - Article

SN - 0169-4332

VL - 414

SP - 63

EP - 67

JO - Applied Surface Science

JF - Applied Surface Science

PB - Elsevier B.V.

ER -

Surface microstructures and corrosion resistance of Ni-Ti-Nb shape memory thin films

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Keywords

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