Small Batch High Throughput Plasma Activated Magnetron Sputtering System

Desmond Gibson; Jerry Martin; Francis Placido; David Childs

doi:10.1364/OIC.2013.ThB.8

Small Batch High Throughput Plasma Activated Magnetron Sputtering System

Desmond Gibson
, Jerry Martin
, Francis Placido
, David Childs

School of Computing, Engineering and Physical Sciences

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Magnetron sputtering offers a flexible and high throughput deposition process for optical coatings. Sputtering uses two or more metal targets, depositing multilayers comprising dielectrics, metals and conductive oxides.

Original language	English
Title of host publication	Optical Interference Coatings
Editors	M. Tilsch , D. Ristau
Publisher	The Optical Society
ISBN (Print)	978-1-55752-970-1
DOIs	https://doi.org/10.1364/OIC.2013.ThB.8
Publication status	Published - Jun 2013
Event	Optical Interference Coatings 2013 - Whistler, Canada Duration: 16 Jun 2013 → 21 Jun 2013

Conference

Conference	Optical Interference Coatings 2013
Country/Territory	Canada
City	Whistler
Period	16/06/13 → 21/06/13

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10.1364/OIC.2013.ThB.8

Cite this

@inproceedings{cc195cf989724998a5731d2a7aac126d,

title = "Small Batch High Throughput Plasma Activated Magnetron Sputtering System",

abstract = "Magnetron sputtering offers a flexible and high throughput deposition process for optical coatings. Sputtering uses two or more metal targets, depositing multilayers comprising dielectrics, metals and conductive oxides.",

author = "Desmond Gibson and Jerry Martin and Francis Placido and David Childs",

year = "2013",

month = jun,

doi = "10.1364/OIC.2013.ThB.8",

language = "English",

isbn = "978-1-55752-970-1",

editor = "\{Tilsch \}, \{M. \} and Ristau, \{D. \}",

booktitle = "Optical Interference Coatings",

publisher = "The Optical Society",

address = "United States",

note = "Optical Interference Coatings 2013 ; Conference date: 16-06-2013 Through 21-06-2013",

}

TY - GEN

T1 - Small Batch High Throughput Plasma Activated Magnetron Sputtering System

AU - Gibson, Desmond

AU - Martin, Jerry

AU - Placido, Francis

AU - Childs, David

PY - 2013/6

Y1 - 2013/6

N2 - Magnetron sputtering offers a flexible and high throughput deposition process for optical coatings. Sputtering uses two or more metal targets, depositing multilayers comprising dielectrics, metals and conductive oxides.

AB - Magnetron sputtering offers a flexible and high throughput deposition process for optical coatings. Sputtering uses two or more metal targets, depositing multilayers comprising dielectrics, metals and conductive oxides.

U2 - 10.1364/OIC.2013.ThB.8

DO - 10.1364/OIC.2013.ThB.8

M3 - Conference contribution

SN - 978-1-55752-970-1

BT - Optical Interference Coatings

A2 - Tilsch , M.

A2 - Ristau, D.

PB - The Optical Society

T2 - Optical Interference Coatings 2013

Y2 - 16 June 2013 through 21 June 2013

ER -

Small Batch High Throughput Plasma Activated Magnetron Sputtering System

Abstract

Conference

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