Single GaAs nanowire based photodetector fabricated by dielectrophoresis

Carlos García Núñez*, Alejandro F. Braña de Cal, Nair Lopez, Jose Luis Pau, Basilio J. García

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)
77 Downloads (Pure)


Mechanical manipulation of nanowires (NWs) for their integration in electronics is still problematic because of their reduced dimensions, risking to produce mechanical damage to the NW structure and electronic properties during the assembly process. In this regard, contactless NW manipulation based methods using non-uniform electric fields, like dielectrophoresis (DEP) are usually much softer than mechanical methods, offering a less destructive alternative for integrating nanostructures in electronic devices. Here, we report a feasible and reproducible dielectrophoretic method to assemble single GaAs NWs (with radius 35–50 nm, and lengths 3–5 μm) on conductive electrodes layout with assembly yields above 90% per site, and alignment yields of 95%. The electrical characteristics of the dielectrophoretic contact formed between a GaAs NW and conductive electrodes have been measured, observing Schottky barrier like contacts. Our results also show the fast fabrication of diodes with rectifying characteristics due to the formation of a low-resistance contact between the Ga catalytic droplet at the tip of the NW when using Al doped ZnO as electrode. The current-voltage characteristics of a single Ga-terminated GaAs NW measured in dark and under illumination exhibit a strong sensitivity to visible light under forward bias conditions (around two orders of magnitude), mainly produced by a change on the series resistance of the device.
Original languageEnglish
Article number225604
Number of pages13
Issue number22
Publication statusPublished - 18 Mar 2020


  • Optoelectronics
  • Nanowire Assembly
  • Dielectrophoresis
  • chemical beam epitaxy
  • GaAs Nanowires
  • photodetectors
  • Nanofabrication


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