Reactive ion etching of Nb thin films for Nb/AlAlOx/Nb Josephson tunnel junctions

Engineering

• Thin Films 100%
• Etch Rate 100%
• Process Parameter 66%
• Design of Experiments 33%
• Response Surface Methodology 33%
• Magnetron 33%
• Photoresist 33%
• Gas Composition 33%
• Main Process 33%
• Silicon Wafer 33%
• Processed Data 33%
• Polynomial Order 33%
• Input Power 33%
• Response Surface 33%
• Gas Mixture 33%
• Experimental Design 33%
• Anisotropy 33%

Material Science

• Regression Analysis 50%

Keyphrases

• Second-order Polynomial 33%