Protective infrared antireflection coating based on sputtered germanium carbide

Keyphrases

• Infrared Antireflection Coating 100%
• Germanium Carbide 100%
• Refractive Index 60%
• Closed Field 40%
• As(III) 20%
• Ion Current Density 20%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 20%
• Low Stress 20%
• Environmental Performance 20%
• Infra 20%
• Germanium 20%
• Growth Conditions 20%
• Magnetron Sputtering Deposition 20%
• Ion Energy 20%
• External Environment 20%
• Antireflection Coating 20%
• Evaporation Process 20%
• H Absorption 20%
• Sputtering Process 20%
• Zinc Sulfide 20%
• Reflection Performance 20%
• Thin Film Growth 20%
• Spectrally Stable 20%
• Single Band 20%
• Unbalanced Magnetron 20%
• Germanium Selenide 20%
• Dual-band 20%
• High-throughput Production 20%
• Electron Mean Free Path 20%
• Zinc Selenide 20%
• Absorption Bands 20%
• Magnetic Confinement 20%
• Infrared Materials 20%
• Hydrogen Content 20%
• High Current Density 20%
• Antireflection 20%
• Efficient Loading 20%

Engineering

• Refractive Index 100%
• Refractivity 100%
• Magnetron 66%
• Ion Current Density 33%
• Ion Energy 33%
• Chemical Vapor Deposition 33%
• Vapor Deposition 33%
• Durables 33%
• Thin Film Growth 33%
• Passbands 33%
• Environmental Performance 33%
• Growth Condition 33%
• Magnetic Confinement 33%
• High Current Density 33%
• Mean Free Path 33%

Material Science

• Germanium 100%
• Carbide 100%
• Antireflection Coating 100%
• Film 42%
• Refractive Index 42%
• Density 28%
• Plasma-Enhanced Chemical Vapor Deposition 14%
• Magnetron Sputtering 14%
• Thin Film Growth 14%
• Absorption Spectra 14%