Plasma processing of niobium for the production of thin-film superconducting devices

Keyphrases

• Plasma Processing 100%
• RF Plasma 100%
• Magnetometer 100%
• Niobium 100%
• Superconducting Devices 100%
• Planar Surfaces 50%
• One Dimension 50%
• Oxidation Mechanism 50%
• Parallel Plates 50%
• Active Elements 50%
• Cleaning Methods 50%
• Small Area 50%
• Nb Film 50%
• High-sensitivity Magnetometer 50%
• Native Oxide 50%
• Reactive Ion Etching 50%
• Rate Profile 50%
• Plasma Etcher 50%
• Bias Voltage 50%
• Vol% 50%
• Edge Profile 50%
• Etching Rate 50%
• Electrical Connection 50%
• Oxide Thickness 50%
• Josephson Junction 50%
• Optical Lithography 50%
• Oxidation Time 50%
• Superconductor 50%
• Junction Characteristics 50%

Engineering

• Thin Films 100%
• Plasma Applications 100%
• Optical Lithography 50%
• Planar Surface 50%
• Active Element 50%
• Bias Voltage 50%
• Josephson Junction 50%
• Etch Rate 50%
• Oxide Thickness 50%
• Electrical Connection 50%
• Parallel Plate 50%
• Superconductor 50%

Material Science

• Superconducting Film 100%
• Magnetometer 100%
• Niobium 100%
• Oxidation Reaction 66%
• Oxide Compound 66%
• Thin Films 33%
• Film 33%
• Cathode 33%
• Lithography 33%
• Reactive Ion Etching 33%
• Superconducting Material 33%
• Josephson Junction 33%
• Surface (Surface Science) 33%