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Optical and durability properties of microwave plasma assisted sputter deposited stoichiometric silicon nitride

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    Abstract

    A study of the optical and mechanical properties of stoichiometric Silicon Nitride deposited using microwave plasma assisted sputtering. A coating stress of -317MPa, hardness of 1.3GPa was obtained with a transmittance range of 300nm-5μm.
    Original languageEnglish
    Title of host publicationOptica OIC - Optical Interference Coatings Conference 2025
    PublisherOptical Society of America
    ISBN (Print)9781957171449
    Publication statusPublished - 2025

    Publication series

    NameTechnical Digest Series
    PublisherOptica Publishing Group

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