Non-stoichiometric silicon nitride for future gravitational wave detectors

Keyphrases

• Gravitational Wave Detectors 100%
• Mechanical Loss 100%
• Ion Beam Assisted Deposition 100%
• Annealing 100%
• Non-stoichiometric 100%
• Stoichiometric Silicon Nitride 100%
• Gas Flow 50%
• Mechanical Properties 50%
• Optical Properties 50%
• Depositional System 50%
• Room Temperature 50%
• Voltage-current 50%
• Heat Treatment Temperature 50%
• Ion Beam 50%
• Post Deposition 50%
• Ion Source 50%
• Extinction Coefficient 50%
• Nitrogen Gas 50%
• Stoichiometry 50%
• Optical Absorption 50%
• Beam Power 50%
• Post-deposition Heat Treatment 50%
• Ion Current 50%
• Process Gases 50%
• SiNx 50%
• Beam Ions 50%
• Silicon Nitride Film 50%

Physics

• Gravitational Wave Detectors 100%
• Silicon Nitride 100%
• Ion Beam 100%
• Heat Treatment 66%
• Thin Films 33%
• Ion Source 33%
• Room Temperature 33%
• Electromagnetic Absorption 33%
• Ion Current 33%
• Stoichiometry 33%
• Gas Flow 33%
• Optical Property 33%

Material Science

• Film 100%
• Silicon Nitride 100%
• Heat Treatment 50%
• Ion Beam Deposition 50%
• Thin Films 25%
• Gas Flow 25%