Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditions

Michal Mazur, Torsten Howind, Desmond Gibson, Danuta Kaczmarek, Jerzy Morgiel, Damian Wojcieszak, Wenzhong Zhu, Piotr Mazur

Research output: Contribution to journalArticle

8 Citations (Scopus)
134 Downloads (Pure)

Abstract

In this work properties of hafnium dioxide (HfO2) thin films deposited by magnetron sputtering with different powers (i.e. 200 W, 400 W and 600 W) were described. Based on microstructure measurements obtained by X-ray diffraction, Raman scattering and transmission electron microscopy method it was observed that there is a significant influence of the sputtering power on investigated properties of HfO2 thin films. Increase of the sputtering power caused, e.g. an increase of average crystallite size and surface roughness. Microstructure of thin films deposited with lower power was composed from a large number of voids that resulted in significant changes of their optical and mechanical properties. Results of optical studies showed that all deposited thin films were well transparent in a visible light range. Refractive index increased gradually with an increase of deposition power from 1.86 (200 W) to 2.09 (600 W). Performed investigations of mechanical properties revealed that hardness and Young’s elastic modulus of HfO2 thin films increased with an increase of the sputtering power.
Original languageEnglish
Pages (from-to)426-431
Number of pages6
JournalSurface & Coatings Technology
Volume320
Early online date2 Dec 2016
DOIs
Publication statusPublished - 25 Jun 2017

    Fingerprint

Keywords

  • HfO2
  • Thin films
  • Magnetron sputtering
  • Microstructure
  • Optical properties
  • Mechanical properties

Cite this