Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering

Cheng Li; Shigeng Song; Ewan Waddell; David Child; Des Gibson

doi:10.1364/oic.2016.wa.10

Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering

Cheng Li
, Shigeng Song
, Ewan Waddell
, David Child
, Des Gibson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Citations (Scopus)

Abstract

A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.

Original language	English
Title of host publication	Optical Interference Coatings 2016
Subtitle of host publication	19-24 June 2016, Tucson, Arizona, United States
Place of Publication	Washington DC
Publisher	Optica Publishing Group (formerly OSA)
DOIs	https://doi.org/10.1364/oic.2016.wa.10
Publication status	Published - 2016

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10.1364/oic.2016.wa.10

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@inproceedings{e7f9ea619a524bb8b227b220246497e8,

title = "Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering",

abstract = "A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.",

author = "Cheng Li and Shigeng Song and Ewan Waddell and David Child and Des Gibson",

year = "2016",

doi = "10.1364/oic.2016.wa.10",

language = "English",

booktitle = "Optical Interference Coatings 2016",

publisher = "Optica Publishing Group (formerly OSA)",

address = "United States",

}

Li, C, Song, S, Waddell, E, Child, D & Gibson, D 2016, Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering. in Optical Interference Coatings 2016: 19-24 June 2016, Tucson, Arizona, United States., WA.10, Optica Publishing Group (formerly OSA), Washington DC. https://doi.org/10.1364/oic.2016.wa.10

Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering. / Li, Cheng; Song, Shigeng; Waddell, Ewan et al.
Optical Interference Coatings 2016: 19-24 June 2016, Tucson, Arizona, United States. Washington DC: Optica Publishing Group (formerly OSA), 2016. WA.10.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering

AU - Li, Cheng

AU - Song, Shigeng

AU - Waddell, Ewan

AU - Child, David

AU - Gibson, Des

PY - 2016

Y1 - 2016

N2 - A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.

AB - A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.

U2 - 10.1364/oic.2016.wa.10

DO - 10.1364/oic.2016.wa.10

M3 - Conference contribution

BT - Optical Interference Coatings 2016

PB - Optica Publishing Group (formerly OSA)

CY - Washington DC

ER -

Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering

Abstract

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