A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.
|Title of host publication
|Optical Interference Coatings 2016
|Subtitle of host publication
|19-24 June 2016, Tucson, Arizona, United States
|Place of Publication
|Optica Publishing Group (formerly OSA)
|Published - 2016