Modelling and validation of a large area thin film uniform deposition on a rotating drum using microwave reactive sputtering

Cheng Li, Shigeng Song, Ewan Waddell, David Child, Des Gibson

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.
Original languageEnglish
Title of host publicationOptical Interference Coatings 2016
Subtitle of host publication19-24 June 2016, Tucson, Arizona, United States
Place of PublicationWashington DC
PublisherOptica Publishing Group (formerly OSA)
DOIs
Publication statusPublished - 2016

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