Modeling and validation of uniform large-area optical coating deposition on a rotating drum using microwave plasma reactive sputtering

Cheng Li; Shigeng Song; Desmond Gibson; David Child; Hin On Chu; Ewan Waddell

doi:10.1364/AO.56.000C65

Modeling and validation of uniform large-area optical coating deposition on a rotating drum using microwave plasma reactive sputtering

Cheng Li, Shigeng Song, Desmond Gibson, David Child, Hin On Chu, Ewan Waddell

School of Computing, Engineering and Physical Sciences

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

Magnetron sputter deposition onto a rotating drum is a method applied to high-throughput large-area optical coating deposition, where film physical thickness uniformity is an important parameter. Techniques have been developed, such as masking/substrate movement, in order to improve sputtered film uniformity. In this study, a model is described and validated for predicting film uniformity. Experimental data show excellent agreement with modeled simulations, with and without a modified sputtering mask. Practical application is demonstrated in maximizing uniformity over an individual substrate size of 100 cm2 for a high-optical-density visible/near-infrared dual-band laser protection filter.

Original language	English
Pages (from-to)	C65-C70
Journal	Applied Optics
Volume	56
Issue number	4
DOIs	https://doi.org/10.1364/AO.56.000C65
Publication status	Published - 1 Feb 2017

Keywords

Deposition and fabrication
Materials and process characterization

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10.1364/AO.56.000C65

Shigeng Song
- School of Computing, Engineering and Physical Sciences - Reader
Person: Academic

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title = "Modeling and validation of uniform large-area optical coating deposition on a rotating drum using microwave plasma reactive sputtering",

abstract = "Magnetron sputter deposition onto a rotating drum is a method applied to high-throughput large-area optical coating deposition, where film physical thickness uniformity is an important parameter. Techniques have been developed, such as masking/substrate movement, in order to improve sputtered film uniformity. In this study, a model is described and validated for predicting film uniformity. Experimental data show excellent agreement with modeled simulations, with and without a modified sputtering mask. Practical application is demonstrated in maximizing uniformity over an individual substrate size of 100 cm2 for a high-optical-density visible/near-infrared dual-band laser protection filter.",

keywords = "Deposition and fabrication, Materials and process characterization",

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AU - Chu, Hin On

AU - Waddell, Ewan

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AB - Magnetron sputter deposition onto a rotating drum is a method applied to high-throughput large-area optical coating deposition, where film physical thickness uniformity is an important parameter. Techniques have been developed, such as masking/substrate movement, in order to improve sputtered film uniformity. In this study, a model is described and validated for predicting film uniformity. Experimental data show excellent agreement with modeled simulations, with and without a modified sputtering mask. Practical application is demonstrated in maximizing uniformity over an individual substrate size of 100 cm2 for a high-optical-density visible/near-infrared dual-band laser protection filter.

KW - Deposition and fabrication

KW - Materials and process characterization

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Modeling and validation of uniform large-area optical coating deposition on a rotating drum using microwave plasma reactive sputtering

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Shigeng Song

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