Modeling and validation of uniform large-area optical coating deposition on a rotating drum using microwave plasma reactive sputtering

Cheng Li, Shigeng Song, Desmond Gibson, David Child, Hin On Chu, Ewan Waddell

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Magnetron sputter deposition onto a rotating drum is a method applied to high-throughput large-area optical coating deposition, where film physical thickness uniformity is an important parameter. Techniques have been developed, such as masking/substrate movement, in order to improve sputtered film uniformity. In this study, a model is described and validated for predicting film uniformity. Experimental data show excellent agreement with modeled simulations, with and without a modified sputtering mask. Practical application is demonstrated in maximizing uniformity over an individual substrate size of 100  cm2 for a high-optical-density visible/near-infrared dual-band laser protection filter.
Original languageEnglish
Pages (from-to)C65-C70
JournalApplied Optics
Volume56
Issue number4
DOIs
Publication statusPublished - 1 Feb 2017

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Keywords

  • Deposition and fabrication
  • Materials and process characterization

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