Mid-infrared optical coatings with improved transparency for 3 to 6μm spectral region using sputtered silicon and oxide films

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Mid infrared optical coatings are commonly designed & manufactured using typically electron beam evaporated films of Silicon and Silicon oxide. However the transparency of these coatings is limited by optical absorption in the films when producing coatings for wavelengths beyond 4um approximately. This work reports improvements in mid infrared (3 to 6um) filter transparency achieved by exploiting recent advances in microwave plasma assisted pulsed DC magnetron sputtering technology. Sputtered silicon compound films have been used to demonstrate efficient room temperature deposited optical coatings for gas sensing applications at wavelengths between 3 to 6um. This process technology allows a new selection of film materials to be used in design of mid infrared filters, with transmission and thermal drift characteristics enhanced compared with conventional electron beam evaporated coatings. The spectral location of the optical coatings is controlled by a non-optical method, which avoids the complex optical monitoring configurations normally required. Durable filters are obtained at room temperature, which would otherwise be required in conventional evaporation processes. Importance of water partial pressure control during deposition for mid infrared is emphasised.
Original languageEnglish
Title of host publicationOptical Systems Design 2015: Advances in Optical Thin Films V
EditorsMichel Lequime, H. Angus Macleod, Detlev Ristau
PublisherSociety of Photo-Optical Instrumentation Engineers
Volume9627
DOIs
Publication statusPublished - 23 Sep 2015

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume9627
ISSN (Print)0277-786X

Fingerprint

optical coatings
silicon films
oxide films
coatings
infrared filters
electron beams
silicon compounds
filters
water pressure
room temperature
silicon oxides
wavelengths
partial pressure
magnetron sputtering
optical absorption
direct current
evaporation
microwaves
silicon
configurations

Cite this

Gibson, D., Song, S., Li, C., Porteous, L., Chu, H. O., Waddell, E., & Hutson, D. (2015). Mid-infrared optical coatings with improved transparency for 3 to 6μm spectral region using sputtered silicon and oxide films. In M. Lequime, H. A. Macleod, & D. Ristau (Eds.), Optical Systems Design 2015: Advances in Optical Thin Films V (Vol. 9627). [96270D] (Proceedings of SPIE; Vol. 9627). Society of Photo-Optical Instrumentation Engineers. https://doi.org/10.1117/12.2191508
Gibson, Desmond ; Song, Shigeng ; Li, Cheng ; Porteous, L. ; Chu, Hin On ; Waddell, Ewan ; Hutson, David. / Mid-infrared optical coatings with improved transparency for 3 to 6μm spectral region using sputtered silicon and oxide films. Optical Systems Design 2015: Advances in Optical Thin Films V. editor / Michel Lequime ; H. Angus Macleod ; Detlev Ristau. Vol. 9627 Society of Photo-Optical Instrumentation Engineers, 2015. (Proceedings of SPIE).
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abstract = "Mid infrared optical coatings are commonly designed & manufactured using typically electron beam evaporated films of Silicon and Silicon oxide. However the transparency of these coatings is limited by optical absorption in the films when producing coatings for wavelengths beyond 4um approximately. This work reports improvements in mid infrared (3 to 6um) filter transparency achieved by exploiting recent advances in microwave plasma assisted pulsed DC magnetron sputtering technology. Sputtered silicon compound films have been used to demonstrate efficient room temperature deposited optical coatings for gas sensing applications at wavelengths between 3 to 6um. This process technology allows a new selection of film materials to be used in design of mid infrared filters, with transmission and thermal drift characteristics enhanced compared with conventional electron beam evaporated coatings. The spectral location of the optical coatings is controlled by a non-optical method, which avoids the complex optical monitoring configurations normally required. Durable filters are obtained at room temperature, which would otherwise be required in conventional evaporation processes. Importance of water partial pressure control during deposition for mid infrared is emphasised.",
author = "Desmond Gibson and Shigeng Song and Cheng Li and L. Porteous and Chu, {Hin On} and Ewan Waddell and David Hutson",
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Gibson, D, Song, S, Li, C, Porteous, L, Chu, HO, Waddell, E & Hutson, D 2015, Mid-infrared optical coatings with improved transparency for 3 to 6μm spectral region using sputtered silicon and oxide films. in M Lequime, HA Macleod & D Ristau (eds), Optical Systems Design 2015: Advances in Optical Thin Films V. vol. 9627, 96270D, Proceedings of SPIE, vol. 9627, Society of Photo-Optical Instrumentation Engineers. https://doi.org/10.1117/12.2191508

Mid-infrared optical coatings with improved transparency for 3 to 6μm spectral region using sputtered silicon and oxide films. / Gibson, Desmond; Song, Shigeng; Li, Cheng; Porteous, L. ; Chu, Hin On; Waddell, Ewan; Hutson, David.

Optical Systems Design 2015: Advances in Optical Thin Films V. ed. / Michel Lequime; H. Angus Macleod; Detlev Ristau. Vol. 9627 Society of Photo-Optical Instrumentation Engineers, 2015. 96270D (Proceedings of SPIE; Vol. 9627).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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AU - Waddell, Ewan

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N2 - Mid infrared optical coatings are commonly designed & manufactured using typically electron beam evaporated films of Silicon and Silicon oxide. However the transparency of these coatings is limited by optical absorption in the films when producing coatings for wavelengths beyond 4um approximately. This work reports improvements in mid infrared (3 to 6um) filter transparency achieved by exploiting recent advances in microwave plasma assisted pulsed DC magnetron sputtering technology. Sputtered silicon compound films have been used to demonstrate efficient room temperature deposited optical coatings for gas sensing applications at wavelengths between 3 to 6um. This process technology allows a new selection of film materials to be used in design of mid infrared filters, with transmission and thermal drift characteristics enhanced compared with conventional electron beam evaporated coatings. The spectral location of the optical coatings is controlled by a non-optical method, which avoids the complex optical monitoring configurations normally required. Durable filters are obtained at room temperature, which would otherwise be required in conventional evaporation processes. Importance of water partial pressure control during deposition for mid infrared is emphasised.

AB - Mid infrared optical coatings are commonly designed & manufactured using typically electron beam evaporated films of Silicon and Silicon oxide. However the transparency of these coatings is limited by optical absorption in the films when producing coatings for wavelengths beyond 4um approximately. This work reports improvements in mid infrared (3 to 6um) filter transparency achieved by exploiting recent advances in microwave plasma assisted pulsed DC magnetron sputtering technology. Sputtered silicon compound films have been used to demonstrate efficient room temperature deposited optical coatings for gas sensing applications at wavelengths between 3 to 6um. This process technology allows a new selection of film materials to be used in design of mid infrared filters, with transmission and thermal drift characteristics enhanced compared with conventional electron beam evaporated coatings. The spectral location of the optical coatings is controlled by a non-optical method, which avoids the complex optical monitoring configurations normally required. Durable filters are obtained at room temperature, which would otherwise be required in conventional evaporation processes. Importance of water partial pressure control during deposition for mid infrared is emphasised.

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Gibson D, Song S, Li C, Porteous L, Chu HO, Waddell E et al. Mid-infrared optical coatings with improved transparency for 3 to 6μm spectral region using sputtered silicon and oxide films. In Lequime M, Macleod HA, Ristau D, editors, Optical Systems Design 2015: Advances in Optical Thin Films V. Vol. 9627. Society of Photo-Optical Instrumentation Engineers. 2015. 96270D. (Proceedings of SPIE). https://doi.org/10.1117/12.2191508