Abstract
Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1m in aperture.
| Original language | English |
|---|---|
| Pages (from-to) | C19-C26 |
| Number of pages | 8 |
| Journal | Applied Optics |
| Volume | 50 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 20 Mar 2011 |
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