Large-aperture plasma-assisted deposition of ICF laser coatings

J. B. Oliver; P. Kupinski; A. L. Rigatti; A. W. Schmid; J. Lambropoulos; S. Papernov; A. Kozlov; J. Spaulding; D. Sadowski; Z. Chrzan; R. Hand; D. R. Gibson; I. Brinkley; F. Placido

Large-aperture plasma-assisted deposition of ICF laser coatings

J. B. Oliver
, P. Kupinski
, A. L. Rigatti
, A. W. Schmid
, J. Lambropoulos
, S. Papernov
, A. Kozlov
, J. Spaulding
, D. Sadowski
, Z. Chrzan
, R. Hand
, D. R. Gibson
, I. Brinkley
, F. Placido

University Of The West Of Scotland

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of largeaperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.

Original language	English
Title of host publication	Optical Interference Coatings, OIC 2010
Publication status	Published - 2010
Event	Optical Interference Coatings, OIC 2010 - Tucson, AZ, United States Duration: 6 Jun 2010 → 11 Jun 2010

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Conference

Conference	Optical Interference Coatings, OIC 2010
Country/Territory	United States
City	Tucson, AZ
Period	6/06/10 → 11/06/10

Cite this

@inproceedings{d1ef71c9a2d44f89af93776aa4c43999,

title = "Large-aperture plasma-assisted deposition of ICF laser coatings",

abstract = "Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of largeaperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.",

author = "Oliver, \{J. B.\} and P. Kupinski and Rigatti, \{A. L.\} and Schmid, \{A. W.\} and J. Lambropoulos and S. Papernov and A. Kozlov and J. Spaulding and D. Sadowski and Z. Chrzan and R. Hand and Gibson, \{D. R.\} and I. Brinkley and F. Placido",

year = "2010",

language = "English",

isbn = "9781557528919",

series = "Optics InfoBase Conference Papers",

booktitle = "Optical Interference Coatings, OIC 2010",

note = "Optical Interference Coatings, OIC 2010 ; Conference date: 06-06-2010 Through 11-06-2010",

}

Oliver, JB, Kupinski, P, Rigatti, AL, Schmid, AW, Lambropoulos, J, Papernov, S, Kozlov, A, Spaulding, J, Sadowski, D, Chrzan, Z, Hand, R, Gibson, DR, Brinkley, I & Placido, F 2010, Large-aperture plasma-assisted deposition of ICF laser coatings. in Optical Interference Coatings, OIC 2010. Optics InfoBase Conference Papers, Optical Interference Coatings, OIC 2010, Tucson, AZ, United States, 6/06/10.

TY - GEN

T1 - Large-aperture plasma-assisted deposition of ICF laser coatings

AU - Oliver, J. B.

AU - Kupinski, P.

AU - Rigatti, A. L.

AU - Schmid, A. W.

AU - Lambropoulos, J.

AU - Papernov, S.

AU - Kozlov, A.

AU - Spaulding, J.

AU - Sadowski, D.

AU - Chrzan, Z.

AU - Hand, R.

AU - Gibson, D. R.

AU - Brinkley, I.

AU - Placido, F.

PY - 2010

Y1 - 2010

N2 - Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of largeaperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.

AB - Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of largeaperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.

UR - https://www.scopus.com/pages/publications/84896760639

M3 - Conference contribution

AN - SCOPUS:84896760639

SN - 9781557528919

T3 - Optics InfoBase Conference Papers

BT - Optical Interference Coatings, OIC 2010

T2 - Optical Interference Coatings, OIC 2010

Y2 - 6 June 2010 through 11 June 2010

ER -

Large-aperture plasma-assisted deposition of ICF laser coatings

Abstract

Publication series

Conference

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