Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of largeaperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.
|Title of host publication||Optical Interference Coatings, OIC 2010|
|Publication status||Published - 2010|
|Event||Optical Interference Coatings, OIC 2010 - Tucson, AZ, United States|
Duration: 6 Jun 2010 → 11 Jun 2010
|Name||Optics InfoBase Conference Papers|
|Conference||Optical Interference Coatings, OIC 2010|
|Period||6/06/10 → 11/06/10|