Large-aperture plasma-assisted deposition of ICF laser coatings

J. B. Oliver, P. Kupinski, A. L. Rigatti, A. W. Schmid, J. Lambropoulos, S. Papernov, A. Kozlov, J. Spaulding, D. Sadowski, Z. Chrzan, R. Hand, D. R. Gibson, I. Brinkley, F. Placido

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of largeaperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2010
Publication statusPublished - 2010
EventOptical Interference Coatings, OIC 2010 - Tucson, AZ, United States
Duration: 6 Jun 201011 Jun 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701


ConferenceOptical Interference Coatings, OIC 2010
Country/TerritoryUnited States
CityTucson, AZ


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