Investigation of TiO2 thin film deposited by microwave plasma assisted sputtering and its application in 3D glasses

Qi Hao, Fu Xiuhua, Shigeng Song, Desmond Gibson, Cheng Li, Hin On Chu, Yongjing Shi

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Abstract

TiO2 deposition using separate regions for sputtering and oxidation is not well investigated. We optimized process parameter for such as oxygen flow and microwave power to produce high quality TiO2 filters for Stereo/3D imaging applications. This deposition technique was chosen for its unique advantages: high deposition rates while increasing the probability of obtaining stoichiometric oxides, reduces possibility of target poisoning and provides better stability of process. Various characterization methods, such as scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman, X-ray diffraction (XRD), transmission spectroscopy, were used in compliment to simulations for detailed analysis of deposited TiO2 thin films. Process parameters were optimized to achieve TiO2 films with low surface scattering and absorption for fabricating multi-passbands interference filter for 3D glasses. From observations and quantitative analysis of surfaces, it was seen that surface roughness increases while oxygen flow or microwave power increases. As the content of anatase phase also increases with higher microwave power and higher oxygen flow, the formation of anatase grains can cause higher surface roughness. Optical analysis of samples validates these trends and provided additional information for absorption trends. Optimized parameters for deposition process are then obtained and the final fabricated 3D glasses filters showed high match to design, within 0.5% range for thickness error.
Original languageEnglish
Article number270
Number of pages14
JournalCOATINGS
Volume8
Issue number8
Publication statusPublished - 2 Aug 2018

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Sputtering
Microwaves
Plasmas
Glass
Thin films
Titanium dioxide
Oxygen
Surface roughness
Surface scattering
Deposition rates
Atomic force microscopy
Spectroscopy
Imaging techniques
X ray diffraction
Oxidation
Scanning electron microscopy
Oxides
Chemical analysis

Keywords

  • TiO2
  • thin films
  • microwave plasma enhanced sputtering
  • process optimization
  • interference optical filter
  • 3D glasses

Cite this

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abstract = "TiO2 deposition using separate regions for sputtering and oxidation is not well investigated. We optimized process parameter for such as oxygen flow and microwave power to produce high quality TiO2 filters for Stereo/3D imaging applications. This deposition technique was chosen for its unique advantages: high deposition rates while increasing the probability of obtaining stoichiometric oxides, reduces possibility of target poisoning and provides better stability of process. Various characterization methods, such as scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman, X-ray diffraction (XRD), transmission spectroscopy, were used in compliment to simulations for detailed analysis of deposited TiO2 thin films. Process parameters were optimized to achieve TiO2 films with low surface scattering and absorption for fabricating multi-passbands interference filter for 3D glasses. From observations and quantitative analysis of surfaces, it was seen that surface roughness increases while oxygen flow or microwave power increases. As the content of anatase phase also increases with higher microwave power and higher oxygen flow, the formation of anatase grains can cause higher surface roughness. Optical analysis of samples validates these trends and provided additional information for absorption trends. Optimized parameters for deposition process are then obtained and the final fabricated 3D glasses filters showed high match to design, within 0.5{\%} range for thickness error.",
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Investigation of TiO2 thin film deposited by microwave plasma assisted sputtering and its application in 3D glasses. / Hao, Qi; Xiuhua, Fu; Song, Shigeng; Gibson, Desmond; Li, Cheng; Chu, Hin On; Shi, Yongjing.

In: COATINGS, Vol. 8, No. 8, 270, 02.08.2018.

Research output: Contribution to journalArticle

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T1 - Investigation of TiO2 thin film deposited by microwave plasma assisted sputtering and its application in 3D glasses

AU - Hao, Qi

AU - Xiuhua, Fu

AU - Song, Shigeng

AU - Gibson, Desmond

AU - Li, Cheng

AU - Chu, Hin On

AU - Shi, Yongjing

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AB - TiO2 deposition using separate regions for sputtering and oxidation is not well investigated. We optimized process parameter for such as oxygen flow and microwave power to produce high quality TiO2 filters for Stereo/3D imaging applications. This deposition technique was chosen for its unique advantages: high deposition rates while increasing the probability of obtaining stoichiometric oxides, reduces possibility of target poisoning and provides better stability of process. Various characterization methods, such as scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman, X-ray diffraction (XRD), transmission spectroscopy, were used in compliment to simulations for detailed analysis of deposited TiO2 thin films. Process parameters were optimized to achieve TiO2 films with low surface scattering and absorption for fabricating multi-passbands interference filter for 3D glasses. From observations and quantitative analysis of surfaces, it was seen that surface roughness increases while oxygen flow or microwave power increases. As the content of anatase phase also increases with higher microwave power and higher oxygen flow, the formation of anatase grains can cause higher surface roughness. Optical analysis of samples validates these trends and provided additional information for absorption trends. Optimized parameters for deposition process are then obtained and the final fabricated 3D glasses filters showed high match to design, within 0.5% range for thickness error.

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