Influence of substrate rotation speed on the nanostructure of sculptured Cu thin films

Hadi Savaloni, Ferydon Babaei, S. Song, F. Placido

Research output: Contribution to journalArticle

Abstract

Different rotation speeds of the substrate about its surface normal were used to produce sculptured copper thin films of ∼ 90 nm thickness. X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to obtain nano-structure and morphology of these films. Their optical properties were measured by spectrophotometry in the spectral range of 340–850 nm. Real and imaginary refractive indices, film thickness and fraction of metal inclusion in the film structure were obtained from optical fitting of the spectrophotometer data.
Original languageEnglish
Pages (from-to)776-781
Number of pages6
JournalVacuum
Volume85
Issue number7
DOIs
Publication statusPublished - 21 Jan 2011

Keywords

  • Sculptured thin films
  • Bruggeman effective medium approximation
  • Substrate rotation speed

Cite this

Savaloni, Hadi ; Babaei, Ferydon ; Song, S. ; Placido, F. / Influence of substrate rotation speed on the nanostructure of sculptured Cu thin films. In: Vacuum. 2011 ; Vol. 85, No. 7. pp. 776-781.
@article{d01179149893445b9b06046e93b73449,
title = "Influence of substrate rotation speed on the nanostructure of sculptured Cu thin films",
abstract = "Different rotation speeds of the substrate about its surface normal were used to produce sculptured copper thin films of ∼ 90 nm thickness. X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to obtain nano-structure and morphology of these films. Their optical properties were measured by spectrophotometry in the spectral range of 340–850 nm. Real and imaginary refractive indices, film thickness and fraction of metal inclusion in the film structure were obtained from optical fitting of the spectrophotometer data.",
keywords = "Sculptured thin films, Bruggeman effective medium approximation, Substrate rotation speed",
author = "Hadi Savaloni and Ferydon Babaei and S. Song and F. Placido",
year = "2011",
month = "1",
day = "21",
doi = "10.1016/j.vacuum.2010.11.017",
language = "English",
volume = "85",
pages = "776--781",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier B.V.",
number = "7",

}

Influence of substrate rotation speed on the nanostructure of sculptured Cu thin films. / Savaloni, Hadi; Babaei, Ferydon; Song, S.; Placido, F.

In: Vacuum, Vol. 85, No. 7, 21.01.2011, p. 776-781.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Influence of substrate rotation speed on the nanostructure of sculptured Cu thin films

AU - Savaloni, Hadi

AU - Babaei, Ferydon

AU - Song, S.

AU - Placido, F.

PY - 2011/1/21

Y1 - 2011/1/21

N2 - Different rotation speeds of the substrate about its surface normal were used to produce sculptured copper thin films of ∼ 90 nm thickness. X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to obtain nano-structure and morphology of these films. Their optical properties were measured by spectrophotometry in the spectral range of 340–850 nm. Real and imaginary refractive indices, film thickness and fraction of metal inclusion in the film structure were obtained from optical fitting of the spectrophotometer data.

AB - Different rotation speeds of the substrate about its surface normal were used to produce sculptured copper thin films of ∼ 90 nm thickness. X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) were employed to obtain nano-structure and morphology of these films. Their optical properties were measured by spectrophotometry in the spectral range of 340–850 nm. Real and imaginary refractive indices, film thickness and fraction of metal inclusion in the film structure were obtained from optical fitting of the spectrophotometer data.

KW - Sculptured thin films

KW - Bruggeman effective medium approximation

KW - Substrate rotation speed

U2 - 10.1016/j.vacuum.2010.11.017

DO - 10.1016/j.vacuum.2010.11.017

M3 - Article

VL - 85

SP - 776

EP - 781

JO - Vacuum

JF - Vacuum

SN - 0042-207X

IS - 7

ER -