Functional photocatalytically active and scratch resistant antireflective coating based on TiO2 and SiO2

M. Mazur, D. Wojcieszak, D. Kaczmarek, J. Domaradzki, S. Song, D. Gibson, F. Placido, P. Mazur, M. Kalisz, A. Poniedzialek

Research output: Contribution to journalArticle

Abstract

Antireflection (AR) multilayer coating, based on combination of five TiO2 and SiO2 thin films, was deposited by microwave assisted reactive magnetron sputtering process on microscope glass substrates. In this work X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and wettability measurements were used to characterize the structural and surface properties of the deposited coating. These studies revealed that prepared coating was amorphous with low surface roughness. Photocatalytic properties were determined based on phenol decomposition reaction. Measurements of optical properties showed that transmittance in the visible wavelength range was increased after the deposition of AR coating as-compared to bare glass substrate. The mechanical properties were determined on the basis of nano-indentation and scratch resistance tests. Performed research has shown that deposition of an additional thin 10 nm thick TiO2 thin film top layer, the prepared AR coating was photocatalytically active, hydrophobic, scratch resistant and had increased hardness as-compared to bare glass substrate. These results indicate that prepared AR multilayer could be used also as a self-cleaning and protective coating.
Original languageEnglish
Pages (from-to)165-171
Number of pages7
JournalApplied Surface Science
Volume380
DOIs
Publication statusPublished - 28 Jan 2016

Keywords

  • Antireflective coating
  • TiO2
  • SiO2
  • Thin films
  • Mechanical properties
  • Optical properties
  • Wettability
  • Photocatalysis

Cite this

Mazur, M. ; Wojcieszak, D. ; Kaczmarek, D. ; Domaradzki, J. ; Song, S. ; Gibson, D. ; Placido, F. ; Mazur, P. ; Kalisz, M. ; Poniedzialek, A. / Functional photocatalytically active and scratch resistant antireflective coating based on TiO2 and SiO2. In: Applied Surface Science. 2016 ; Vol. 380. pp. 165-171.
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author = "M. Mazur and D. Wojcieszak and D. Kaczmarek and J. Domaradzki and S. Song and D. Gibson and F. Placido and P. Mazur and M. Kalisz and A. Poniedzialek",
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Mazur, M, Wojcieszak, D, Kaczmarek, D, Domaradzki, J, Song, S, Gibson, D, Placido, F, Mazur, P, Kalisz, M & Poniedzialek, A 2016, 'Functional photocatalytically active and scratch resistant antireflective coating based on TiO2 and SiO2', Applied Surface Science, vol. 380, pp. 165-171. https://doi.org/10.1016/j.apsusc.2016.01.226

Functional photocatalytically active and scratch resistant antireflective coating based on TiO2 and SiO2. / Mazur, M.; Wojcieszak, D.; Kaczmarek, D.; Domaradzki, J.; Song, S.; Gibson, D.; Placido, F.; Mazur, P.; Kalisz, M.; Poniedzialek, A.

In: Applied Surface Science, Vol. 380, 28.01.2016, p. 165-171.

Research output: Contribution to journalArticle

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T1 - Functional photocatalytically active and scratch resistant antireflective coating based on TiO2 and SiO2

AU - Mazur, M.

AU - Wojcieszak, D.

AU - Kaczmarek, D.

AU - Domaradzki, J.

AU - Song, S.

AU - Gibson, D.

AU - Placido, F.

AU - Mazur, P.

AU - Kalisz, M.

AU - Poniedzialek, A.

PY - 2016/1/28

Y1 - 2016/1/28

N2 - Antireflection (AR) multilayer coating, based on combination of five TiO2 and SiO2 thin films, was deposited by microwave assisted reactive magnetron sputtering process on microscope glass substrates. In this work X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and wettability measurements were used to characterize the structural and surface properties of the deposited coating. These studies revealed that prepared coating was amorphous with low surface roughness. Photocatalytic properties were determined based on phenol decomposition reaction. Measurements of optical properties showed that transmittance in the visible wavelength range was increased after the deposition of AR coating as-compared to bare glass substrate. The mechanical properties were determined on the basis of nano-indentation and scratch resistance tests. Performed research has shown that deposition of an additional thin 10 nm thick TiO2 thin film top layer, the prepared AR coating was photocatalytically active, hydrophobic, scratch resistant and had increased hardness as-compared to bare glass substrate. These results indicate that prepared AR multilayer could be used also as a self-cleaning and protective coating.

AB - Antireflection (AR) multilayer coating, based on combination of five TiO2 and SiO2 thin films, was deposited by microwave assisted reactive magnetron sputtering process on microscope glass substrates. In this work X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and wettability measurements were used to characterize the structural and surface properties of the deposited coating. These studies revealed that prepared coating was amorphous with low surface roughness. Photocatalytic properties were determined based on phenol decomposition reaction. Measurements of optical properties showed that transmittance in the visible wavelength range was increased after the deposition of AR coating as-compared to bare glass substrate. The mechanical properties were determined on the basis of nano-indentation and scratch resistance tests. Performed research has shown that deposition of an additional thin 10 nm thick TiO2 thin film top layer, the prepared AR coating was photocatalytically active, hydrophobic, scratch resistant and had increased hardness as-compared to bare glass substrate. These results indicate that prepared AR multilayer could be used also as a self-cleaning and protective coating.

KW - Antireflective coating

KW - TiO2

KW - SiO2

KW - Thin films

KW - Mechanical properties

KW - Optical properties

KW - Wettability

KW - Photocatalysis

U2 - 10.1016/j.apsusc.2016.01.226

DO - 10.1016/j.apsusc.2016.01.226

M3 - Article

VL - 380

SP - 165

EP - 171

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -