Functional photocatalytically active and scratch resistant antireflective coating based on TiO2 and SiO2

M. Mazur, D. Wojcieszak, D. Kaczmarek, J. Domaradzki, S. Song, D. Gibson, F. Placido, P. Mazur, M. Kalisz, A. Poniedzialek

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74 Citations (Scopus)


Antireflection (AR) multilayer coating, based on combination of five TiO2 and SiO2 thin films, was deposited by microwave assisted reactive magnetron sputtering process on microscope glass substrates. In this work X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and wettability measurements were used to characterize the structural and surface properties of the deposited coating. These studies revealed that prepared coating was amorphous with low surface roughness. Photocatalytic properties were determined based on phenol decomposition reaction. Measurements of optical properties showed that transmittance in the visible wavelength range was increased after the deposition of AR coating as-compared to bare glass substrate. The mechanical properties were determined on the basis of nano-indentation and scratch resistance tests. Performed research has shown that deposition of an additional thin 10 nm thick TiO2 thin film top layer, the prepared AR coating was photocatalytically active, hydrophobic, scratch resistant and had increased hardness as-compared to bare glass substrate. These results indicate that prepared AR multilayer could be used also as a self-cleaning and protective coating.
Original languageEnglish
Pages (from-to)165-171
Number of pages7
JournalApplied Surface Science
Publication statusPublished - 28 Jan 2016


  • Antireflective coating
  • TiO2
  • SiO2
  • Thin films
  • Mechanical properties
  • Optical properties
  • Wettability
  • Photocatalysis


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