Fast coatings for DWDM filters

D. Gibson

Fast coatings for DWDM filters

D. Gibson

Research output: Contribution to specialist publication › Article

Abstract

The improvement in the speed and yield of precision electron-beam vacuum-deposited optical filters was discussed using optical feedback and plasma assisted technology. The plasma deposition source neutralizes plasma space charges near the substrate edge to counteract film thickness variations. Nonplasma neutralization from changes in plasma voltage could lead to a variation in assist deposition. Film thickness uniformity enhancement and flexibility in system setup was achieved by mounting electron beam guns on a separate plinth.

Original language	English
Pages	114-116
Number of pages	3
Volume	35
No.	2
Specialist publication	Photonics Spectra
Publication status	Published - 2001

Cite this

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title = "Fast coatings for DWDM filters",

abstract = "The improvement in the speed and yield of precision electron-beam vacuum-deposited optical filters was discussed using optical feedback and plasma assisted technology. The plasma deposition source neutralizes plasma space charges near the substrate edge to counteract film thickness variations. Nonplasma neutralization from changes in plasma voltage could lead to a variation in assist deposition. Film thickness uniformity enhancement and flexibility in system setup was achieved by mounting electron beam guns on a separate plinth.",

author = "D. Gibson",

year = "2001",

language = "English",

volume = "35",

pages = "114--116",

journal = "Photonics Spectra",

issn = "0731-1230",

publisher = "Laurin Publishing Co. Inc.",

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T1 - Fast coatings for DWDM filters

AU - Gibson, D.

PY - 2001

Y1 - 2001

N2 - The improvement in the speed and yield of precision electron-beam vacuum-deposited optical filters was discussed using optical feedback and plasma assisted technology. The plasma deposition source neutralizes plasma space charges near the substrate edge to counteract film thickness variations. Nonplasma neutralization from changes in plasma voltage could lead to a variation in assist deposition. Film thickness uniformity enhancement and flexibility in system setup was achieved by mounting electron beam guns on a separate plinth.

AB - The improvement in the speed and yield of precision electron-beam vacuum-deposited optical filters was discussed using optical feedback and plasma assisted technology. The plasma deposition source neutralizes plasma space charges near the substrate edge to counteract film thickness variations. Nonplasma neutralization from changes in plasma voltage could lead to a variation in assist deposition. Film thickness uniformity enhancement and flexibility in system setup was achieved by mounting electron beam guns on a separate plinth.

UR - https://www.scopus.com/pages/publications/0035262810

M3 - Article

SN - 0731-1230

VL - 35

SP - 114

EP - 116

JO - Photonics Spectra

JF - Photonics Spectra

ER -

Fast coatings for DWDM filters

Abstract

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