The improvement in the speed and yield of precision electron-beam vacuum-deposited optical filters was discussed using optical feedback and plasma assisted technology. The plasma deposition source neutralizes plasma space charges near the substrate edge to counteract film thickness variations. Nonplasma neutralization from changes in plasma voltage could lead to a variation in assist deposition. Film thickness uniformity enhancement and flexibility in system setup was achieved by mounting electron beam guns on a separate plinth.
|Number of pages||3|
|Specialist publication||PHOTONICS SPECTRA|
|Publication status||Published - 2001|