Engineering & Materials Science
Ion beam assisted deposition
100%
Thin films
53%
Oxygen
45%
Optical constants
20%
Ion sources
17%
Hall effect
15%
Refractive index
14%
Light transmission
14%
Atomic force microscopy
14%
Optical properties
13%
Structural properties
12%
Film thickness
12%
Electric properties
11%
X ray diffraction
11%
Ions
10%
Glass
8%
Substrates
7%
Physics & Astronomy
ITO (semiconductors)
58%
ion beams
43%
oxygen
33%
thin films
28%
transmittance
23%
oxygen ions
15%
ion sources
13%
Hall effect
12%
extinction
11%
film thickness
11%
atomic force microscopy
10%
electrical properties
10%
refractivity
9%
optical properties
9%
electrical resistivity
8%
glass
8%
coefficients
7%
diffraction
7%
x rays
6%
Chemical Compounds
Ion Beam
61%
Flow
36%
Dioxygen
27%
Liquid Film
27%
Transmittance
22%
Optical Constant
16%
Hall Effect
16%
Optical Transmission
15%
Glass Substrate
11%
Refractive Index
10%
Electrical Property
9%
Atomic Force Microscopy
8%
Ion
8%
Optical Property
8%
Pressure
6%
X-Ray Diffraction
5%