Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography

Jonathan Pomfret; Sijia Cai; Daxing Han; Des Gibson; Shigeng Song; David Hutson; Peter Mackay

doi:10.1364/OIC.2022.MD.8

Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography

Jonathan Pomfret^*, Sijia Cai, Daxing Han, Des Gibson, Shigeng Song, David Hutson, Peter Mackay

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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Abstract

A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.

Original language	English
Title of host publication	Optical Interference Coatings Conference (OIC) 2022
Editors	R. Sargent, A. Sytchkova
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Electronic)	9781557528209
DOIs	https://doi.org/10.1364/OIC.2022.MD.8
Publication status	Published - 2022
Event	Optical Interference Coatings, OIC 2022 - Vancouver, Canada Duration: 19 Jun 2022 → 24 Jun 2022

Publication series

Name	Technical Digest Series
Publisher	Optica Publishing Group

Conference

Conference	Optical Interference Coatings, OIC 2022
Country/Territory	Canada
City	Vancouver
Period	19/06/22 → 24/06/22

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10.1364/OIC.2022.MD.8

2022 03 18 Pomfret et al Design acceptedAccepted author manuscript, 195 KB

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Pomfret, J., Cai, S., Han, D., Gibson, D., Song, S., Hutson, D., & Mackay, P. (2022). Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography. In R. Sargent, & A. Sytchkova (Eds.), Optical Interference Coatings Conference (OIC) 2022 Article MD.8 (Technical Digest Series). Optica Publishing Group (formerly OSA). https://doi.org/10.1364/OIC.2022.MD.8

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title = "Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography",

abstract = "A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.",

author = "Jonathan Pomfret and Sijia Cai and Daxing Han and Des Gibson and Shigeng Song and David Hutson and Peter Mackay",

year = "2022",

doi = "10.1364/OIC.2022.MD.8",

language = "English",

series = "Technical Digest Series",

publisher = "Optica Publishing Group (formerly OSA)",

editor = "R. Sargent and A. Sytchkova",

booktitle = "Optical Interference Coatings Conference (OIC) 2022",

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Pomfret, J, Cai, S, Han, D, Gibson, D , Song, S, Hutson, D & Mackay, P 2022, Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography. in R Sargent & A Sytchkova (eds), Optical Interference Coatings Conference (OIC) 2022., MD.8, Technical Digest Series, Optica Publishing Group (formerly OSA), Optical Interference Coatings, OIC 2022, Vancouver, Canada, 19/06/22. https://doi.org/10.1364/OIC.2022.MD.8

Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography. / Pomfret, Jonathan; Cai, Sijia; Han, Daxing et al.
Optical Interference Coatings Conference (OIC) 2022. ed. / R. Sargent; A. Sytchkova. Optica Publishing Group (formerly OSA), 2022. MD.8 (Technical Digest Series).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography

AU - Pomfret, Jonathan

AU - Cai, Sijia

AU - Han, Daxing

AU - Gibson, Des

AU - Song, Shigeng

AU - Hutson, David

AU - Mackay, Peter

PY - 2022

Y1 - 2022

N2 - A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.

AB - A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.

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U2 - 10.1364/OIC.2022.MD.8

DO - 10.1364/OIC.2022.MD.8

M3 - Conference contribution

AN - SCOPUS:85139156287

T3 - Technical Digest Series

BT - Optical Interference Coatings Conference (OIC) 2022

A2 - Sargent, R.

A2 - Sytchkova, A.

PB - Optica Publishing Group (formerly OSA)

T2 - Optical Interference Coatings, OIC 2022

Y2 - 19 June 2022 through 24 June 2022

ER -

Pomfret J, Cai S, Han D, Gibson D , Song S, Hutson D et al. Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography. In Sargent R, Sytchkova A, editors, Optical Interference Coatings Conference (OIC) 2022. Optica Publishing Group (formerly OSA). 2022. MD.8. (Technical Digest Series). doi: 10.1364/OIC.2022.MD.8

Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography

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