Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography

Jonathan Pomfret*, Sijia Cai, Daxing Han, Des Gibson, Shigeng Song, David Hutson, Peter Mackay

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.

Original languageEnglish
Title of host publicationOptical Interference Coatings Conference (OIC) 2022
EditorsR. Sargent, A. Sytchkova
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)9781557528209
DOIs
Publication statusPublished - 2022
EventOptical Interference Coatings, OIC 2022 - Vancouver, Canada
Duration: 19 Jun 202224 Jun 2022

Publication series

NameTechnical Digest Series
PublisherOptica Publishing Group

Conference

ConferenceOptical Interference Coatings, OIC 2022
Country/TerritoryCanada
CityVancouver
Period19/06/2224/06/22

Fingerprint

Dive into the research topics of 'Design and fabrication of a patterned dual colour filter using microwave plasma assisted sputtering and photolithography'. Together they form a unique fingerprint.

Cite this