Corrigendum to “Enhanced hollow cathode plasma source for assisted low pressure electron beam deposition processes” [Surf. Coat. Technol. 267 (15.04.2015) 105–110]

David Child*, Des Gibson*, Frank Placido, Ewan Waddell, John Kavanagh

*Corresponding author for this work

Research output: Contribution to journalComment/debatepeer-review

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Abstract

The Authors regret that the Young's Modulus and Hardness measurements were not properly acknowledged and the passage referring to Fig. 8 (page 109) is inaccurate with regard to the measurement method. 

As such following together with affiliation to be added as an author (page 105): - “John Kavanagh, Research Centre in Surface Engineering, Department of Materials Science and Engineering, The University of Sheffield, Sheffield S1 3JD, UK”. 

Also paragraph 6 in Section 3.4 page 109 as follows; 

“The same samples were measured using a Hysitron SN5 060-040 triboscope set to 40 nm depth to minimise substrate effects with the reduced Young's modulus and hardness calculated. Fig. 8 shows the corresponding reduced Young's modulus and hardness.” to be replaced with the following; 

“A Hysitron triboscope was used to measure the same samples with the applied force chosen to keep indentation depth at approximately 10% of film thickness to minimise substrate contributions. Fig. 8 shows the calculated reduced Young's modulus and hardness.” 

In addition Fig. 8 caption, Section 3.4 page 109, “Reduced Young's modulus Er and hardness H calculated from nanoindentations at 500 μm with indentation depth at 10% of film thickness; 4 indentations per measurement” should read “Reduced Young's modulus Er and hardness H calculated from nanoindentations at 500 μN”. 

The Authors would like to apologise for any inconvenience caused.

Original languageEnglish
Pages (from-to)1135-1135
Number of pages1
JournalSurface and Coatings Technology
Volume309
Early online date26 Oct 2016
DOIs
Publication statusPublished - 15 Jan 2017

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