In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films.
- gas impulse magnetron sputtering
- thin films
- Surface Properties
- Optical properties
- mechanical properties
- scratch resistance
Wiatrowski, A., Mazur, M., Obstarczyk, A., Wojcieszak, D., Kaczmarek, D., Morgiel, J., & Gibson, D. (2018). Comparison of the physicochemical properties of TiO2 thin films obtained by magnetron sputtering with continuous and pulsed gas flow. Coatings, 8(11), . https://doi.org/10.3390/coatings8110412