Closed field magnetron sputtering: a new strategy for multilayer optical coatings

J.M. Walls, D.R. Gibson, I. Brinkley, D.G. Teer, P. Teer, J. Hampshire

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)


Magnetron sputtering has many advantages for multilayer optical coating since the process operates at high energy, producing dense, stable coatings with outstanding durability. The "closed field" magnetron (CFM) process for optical coatings uses two or more different metal targets. The target is held in a partially oxidized state controlled using plasma emission monitoring. The oxidation occurs in the entire volume around the rotating substrate carrier. The ion current density and the low bias voltage provided by CFM sputtering deposits films at a high rate with excellent optical properties. This paper presents the optical properties of a range of metaloxide layers. Machines based on the CFM process are scalable to meet a range of batch and substrate size requirements.
Original languageEnglish
Title of host publicationProceedings, Annual Technical Conference - Society of Vacuum Coaters
Number of pages6
Publication statusPublished - May 2003
Externally publishedYes
Event46th Annual Technical Conference Proceedings - San Fransisco, United States Minor Outlying Islands
Duration: 3 May 20038 May 2003


Conference46th Annual Technical Conference Proceedings
Country/TerritoryUnited States Minor Outlying Islands
CitySan Fransisco


  • Ion-assisted deposition
  • Magnetron sputtering
  • Optical coating equipment
  • Optical coatings


Dive into the research topics of 'Closed field magnetron sputtering: a new strategy for multilayer optical coatings'. Together they form a unique fingerprint.

Cite this