Closed field magnetron sputtering: a new strategy for multilayer optical coatings

J.M. Walls; D.R. Gibson; I. Brinkley; D.G. Teer; P. Teer; J. Hampshire

Closed field magnetron sputtering: a new strategy for multilayer optical coatings

J.M. Walls, D.R. Gibson, I. Brinkley, D.G. Teer, P. Teer, J. Hampshire

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Magnetron sputtering has many advantages for multilayer optical coating since the process operates at high energy, producing dense, stable coatings with outstanding durability. The "closed field" magnetron (CFM) process for optical coatings uses two or more different metal targets. The target is held in a partially oxidized state controlled using plasma emission monitoring. The oxidation occurs in the entire volume around the rotating substrate carrier. The ion current density and the low bias voltage provided by CFM sputtering deposits films at a high rate with excellent optical properties. This paper presents the optical properties of a range of metaloxide layers. Machines based on the CFM process are scalable to meet a range of batch and substrate size requirements.

Original language	English
Title of host publication	Proceedings, Annual Technical Conference - Society of Vacuum Coaters
Pages	387-392
Number of pages	6
Publication status	Published - May 2003
Externally published	Yes
Event	46th Annual Technical Conference Proceedings - San Fransisco, United States Minor Outlying Islands Duration: 3 May 2003 → 8 May 2003

Conference

Conference	46th Annual Technical Conference Proceedings
Country/Territory	United States Minor Outlying Islands
City	San Fransisco
Period	3/05/03 → 8/05/03

Keywords

Ion-assisted deposition
Magnetron sputtering
Optical coating equipment
Optical coatings

Cite this

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title = "Closed field magnetron sputtering: a new strategy for multilayer optical coatings",

abstract = "Magnetron sputtering has many advantages for multilayer optical coating since the process operates at high energy, producing dense, stable coatings with outstanding durability. The {"}closed field{"} magnetron (CFM) process for optical coatings uses two or more different metal targets. The target is held in a partially oxidized state controlled using plasma emission monitoring. The oxidation occurs in the entire volume around the rotating substrate carrier. The ion current density and the low bias voltage provided by CFM sputtering deposits films at a high rate with excellent optical properties. This paper presents the optical properties of a range of metaloxide layers. Machines based on the CFM process are scalable to meet a range of batch and substrate size requirements.",

keywords = "Ion-assisted deposition, Magnetron sputtering, Optical coating equipment, Optical coatings",

author = "J.M. Walls and D.R. Gibson and I. Brinkley and D.G. Teer and P. Teer and J. Hampshire",

year = "2003",

month = may,

language = "English",

pages = "387--392",

booktitle = "Proceedings, Annual Technical Conference - Society of Vacuum Coaters",

note = "46th Annual Technical Conference Proceedings ; Conference date: 03-05-2003 Through 08-05-2003",

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T1 - Closed field magnetron sputtering

T2 - 46th Annual Technical Conference Proceedings

AU - Walls, J.M.

AU - Gibson, D.R.

AU - Brinkley, I.

AU - Teer, D.G.

AU - Teer, P.

AU - Hampshire, J.

PY - 2003/5

Y1 - 2003/5

N2 - Magnetron sputtering has many advantages for multilayer optical coating since the process operates at high energy, producing dense, stable coatings with outstanding durability. The "closed field" magnetron (CFM) process for optical coatings uses two or more different metal targets. The target is held in a partially oxidized state controlled using plasma emission monitoring. The oxidation occurs in the entire volume around the rotating substrate carrier. The ion current density and the low bias voltage provided by CFM sputtering deposits films at a high rate with excellent optical properties. This paper presents the optical properties of a range of metaloxide layers. Machines based on the CFM process are scalable to meet a range of batch and substrate size requirements.

AB - Magnetron sputtering has many advantages for multilayer optical coating since the process operates at high energy, producing dense, stable coatings with outstanding durability. The "closed field" magnetron (CFM) process for optical coatings uses two or more different metal targets. The target is held in a partially oxidized state controlled using plasma emission monitoring. The oxidation occurs in the entire volume around the rotating substrate carrier. The ion current density and the low bias voltage provided by CFM sputtering deposits films at a high rate with excellent optical properties. This paper presents the optical properties of a range of metaloxide layers. Machines based on the CFM process are scalable to meet a range of batch and substrate size requirements.

KW - Ion-assisted deposition

KW - Magnetron sputtering

KW - Optical coating equipment

KW - Optical coatings

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M3 - Conference contribution

SP - 387

EP - 392

BT - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Y2 - 3 May 2003 through 8 May 2003

ER -

Closed field magnetron sputtering: a new strategy for multilayer optical coatings

Abstract

Conference

Keywords

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