Broadband infrared absorber based on a sputter deposited hydrogenated carbon multilayer enhancing MEMS-based CMOS thermopile performance

Sam Ahmadzadeh*, Des Gibson, Lewis Fleming, David Hutson, Shigeng Song, Allan James, Stephen Wells, Alan Forsyth, Suzanne Bruckshaw

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Based on pulsed DC sputter deposition of hydrogenated carbon, an absorber optical coating with maximized broadband infrared absorptance is reported. Enhanced broadband (2.5–20 µm) infrared absorptance (>90%) with reduced infrared reflection is achieved by combining a low-absorptance antireflective (hydrogenated carbon) overcoat with a broadband-absorptance carbon underlayer (nonhydrogenated). The infrared optical absorptance of sputter deposited carbon with incorporated hydrogen is reduced. As such, hydrogen flow optimization to minimize reflection loss, maximize broadband absorptance, and achieve stress balance is described. Application to complementary metal-oxide-semiconductor (CMOS) produced microelectromechanical systems (MEMS) thermopile device wafers is described. A 220% increase in thermopile output voltage is demonstrated, in agreement with modeled prediction.
Original languageEnglish
Pages (from-to)B79-B86
Number of pages8
JournalApplied Optics
Volume62
Issue number7
Early online date5 Jan 2023
DOIs
Publication statusPublished - 1 Mar 2023

Keywords

  • atomic and molecular physics, and optics
  • engineering (miscellaneous)
  • electrical and electronic engineering

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