Abstract
Apparatus 10 for treating a substrate, comprising: a vacuum chamber 12; a substrate carrier 14 adapted to carry a substrate 16 to be treated; a source material holder (22, Fig 2) for holding a source material (34, Fig 6) with which the substrate 16 is to be treated; and vaporising or sputtering means 20 for vaporising/sputtering the source material (34); wherein the source material holder (22) includes a positioning means (24, Fig 2) for relatively moving the source material (34) towards the substrate carrier
| Original language | English |
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| Patent number | GB2368595 |
| Publication status | Published - 8 May 2002 |