A robust fabrication process for a refractory integrated SQUID gradiometer

David Hutson; Ron G. Weston; Rhoddy J P. Bain; Matt  J. Lawrenson; Colin M. Pegrum; Katia Popova; Roberto Scarfone

doi:10.1109/77.403044

A robust fabrication process for a refractory integrated SQUID gradiometer

David Hutson, Ron G. Weston, Rhoddy J P. Bain, Matt J. Lawrenson, Colin M. Pegrum, Katia Popova, Roberto Scarfone

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

We describe a process used successfully to fabricate large second-order planar gradiometers with integrated DC SQUIDs on two-inch silicon wafers. All the refractory materials (Nb, Mo and SiO/sub 2/) are deposited by magnetron sputtering. The Josephson junctions are based on the well-established Nb/AlO/sub x//Nb trilayer technology. All Nb layers are patterned by Reactive Ion Etching using a procedure optimized by experimental design. Since only one gradiometer can fit on a wafer, extra care had to be taken in both the design of the device and the fabrication process to ensure that the yield was high. Excellent process latitude is achieved by sufficient built-in design margins to accommodate any tolerance difficulties during fabrication

Original language	English
Pages (from-to)	2295-2298
Number of pages	4
Journal	IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
Volume	5
Issue number	2
DOIs	https://doi.org/10.1109/77.403044
Publication status	Published - Jun 1995
Externally published	Yes

Access to Document

10.1109/77.403044

Cite this

@article{c49a9c46a8a6497db721346992b8af8c,

title = "A robust fabrication process for a refractory integrated SQUID gradiometer",

abstract = "We describe a process used successfully to fabricate large second-order planar gradiometers with integrated DC SQUIDs on two-inch silicon wafers. All the refractory materials (Nb, Mo and SiO/sub 2/) are deposited by magnetron sputtering. The Josephson junctions are based on the well-established Nb/AlO/sub x//Nb trilayer technology. All Nb layers are patterned by Reactive Ion Etching using a procedure optimized by experimental design. Since only one gradiometer can fit on a wafer, extra care had to be taken in both the design of the device and the fabrication process to ensure that the yield was high. Excellent process latitude is achieved by sufficient built-in design margins to accommodate any tolerance difficulties during fabrication",

author = "David Hutson and Weston, {Ron G.} and Bain, {Rhoddy J P.} and Lawrenson, {Matt J.} and Pegrum, {Colin M.} and Katia Popova and Roberto Scarfone",

year = "1995",

month = jun,

doi = "10.1109/77.403044",

language = "English",

volume = "5",

pages = "2295--2298",

journal = "IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY",

issn = "1051-8223",

publisher = "IEEE",

number = "2",

}

TY - JOUR

T1 - A robust fabrication process for a refractory integrated SQUID gradiometer

AU - Hutson, David

AU - Weston, Ron G.

AU - Bain, Rhoddy J P.

AU - Lawrenson, Matt J.

AU - Pegrum, Colin M.

AU - Popova, Katia

AU - Scarfone, Roberto

PY - 1995/6

Y1 - 1995/6

N2 - We describe a process used successfully to fabricate large second-order planar gradiometers with integrated DC SQUIDs on two-inch silicon wafers. All the refractory materials (Nb, Mo and SiO/sub 2/) are deposited by magnetron sputtering. The Josephson junctions are based on the well-established Nb/AlO/sub x//Nb trilayer technology. All Nb layers are patterned by Reactive Ion Etching using a procedure optimized by experimental design. Since only one gradiometer can fit on a wafer, extra care had to be taken in both the design of the device and the fabrication process to ensure that the yield was high. Excellent process latitude is achieved by sufficient built-in design margins to accommodate any tolerance difficulties during fabrication

AB - We describe a process used successfully to fabricate large second-order planar gradiometers with integrated DC SQUIDs on two-inch silicon wafers. All the refractory materials (Nb, Mo and SiO/sub 2/) are deposited by magnetron sputtering. The Josephson junctions are based on the well-established Nb/AlO/sub x//Nb trilayer technology. All Nb layers are patterned by Reactive Ion Etching using a procedure optimized by experimental design. Since only one gradiometer can fit on a wafer, extra care had to be taken in both the design of the device and the fabrication process to ensure that the yield was high. Excellent process latitude is achieved by sufficient built-in design margins to accommodate any tolerance difficulties during fabrication

U2 - 10.1109/77.403044

DO - 10.1109/77.403044

M3 - Article

SN - 1051-8223

VL - 5

SP - 2295

EP - 2298

JO - IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY

JF - IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY

IS - 2

ER -

A robust fabrication process for a refractory integrated SQUID gradiometer

Abstract

Access to Document

Fingerprint

Cite this